The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

Sep. 25, 2003
Applicants:

Toru Fujita, Nagano-ken, JP;

Yoshiro Koga, Nagano-ken, JP;

Atsunori Kitazawa, Nagano-ken, JP;

Masahide Nakamura, Nagano-ken, JP;

Inventors:

Toru Fujita, Nagano-ken, JP;

Yoshiro Koga, Nagano-ken, JP;

Atsunori Kitazawa, Nagano-ken, JP;

Masahide Nakamura, Nagano-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A liquid development apparatus utilizes wet development as a development method and an image forming technique. The apparatus uses squeegee rollers, disposed facing a developer roller, and moved to adjacent positions at which the squeegee rollers contact a liquid developer which is on the developer roller. Density adjustment bias generators are connected between the developer roller and the squeegee rollers. The density adjustment bias generators include, among other things, positive bias power source parts, negative bias power source parts, short-circuit line parts, and switches which switch connections of the respective parts through in accordance with a control signal received from a CPU. A method that the apparatus performs is also provided.


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