The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

Jan. 05, 2001
Applicants:

Vincent S. Polkus, Delafield, WI (US);

Thomas M. Leeds, Pewaukee, WI (US);

Mohamed Ali Hamadeh, Waukesha, WI (US);

Ping Xue, Cottage Grove, WI (US);

Inventors:

Vincent S. Polkus, Delafield, WI (US);

Thomas M. Leeds, Pewaukee, WI (US);

Mohamed Ali Hamadeh, Waukesha, WI (US);

Ping Xue, Cottage Grove, WI (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A technique for selectively processing data from a digital detector includes determining an asymmetrical image area produced by orientation of a radiation source assembly. The assembly may include a radiation source and a collimator, which may be separately orientable. The image area is computed based upon the orientation of the radiation source assembly that projects a radiation beam towards an imaging plane. Image data from a detector within the imaging plane is selectively processed to improve computational efficiency. The system may also determine whether the image area falls within the imaging surface of the detector and inform an operator or inhibit an exposure if such is not the case.


Find Patent Forward Citations

Loading…