The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

Jul. 18, 2003
Applicants:

Hideyuki Ikeda, Kyoto, JP;

Yoshiaki Togawa, Kyoto, JP;

Inventors:

Hideyuki Ikeda, Kyoto, JP;

Yoshiaki Togawa, Kyoto, JP;

Assignee:

Horiba, Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a particle diameter distribution measuring method, a particle diameter distribution measuring device, and a measuring program which decreases the dependence of the calculation of particle diameter distribution on sample concentration, and can measure with higher precision by setting a concentration correction unique to a specific measuring sample in a particle diameter distribution measuring device. The measuring sample is measured by changing its concentration. Concentration correction constants for correcting detection values of detectors according to the concentration of the sample are found. The detection values of the respective detectors are corrected by using the concentration correction constants, and the particle diameter distribution is measured by using the corrected detection values of the respective detectors.


Find Patent Forward Citations

Loading…