The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Aug. 27, 2002
David Norman Jamieson, Melbourne, AU;
Steven Prawer, Sydney, AU;
Andrew Steven Dzurak, Potts Point, AU;
Robert Graham Clark, Balgowlah Heights, AU;
Changyi Yang, Box Hill, AU;
David Norman Jamieson, Melbourne, AU;
Steven Prawer, Sydney, AU;
Andrew Steven Dzurak, Potts Point, AU;
Robert Graham Clark, Balgowlah Heights, AU;
Changyi Yang, Box Hill, AU;
Qucor Pty Ltd, Sydney, AU;
Abstract
This invention concerns a method and system for single ion doping and machining by detecting the impact, penetration and stopping of single ions in a substrate. Such detection is essential for the successful implantation of a counted number ofP ions into a semi-conductor substrate for construction of a Kane quantum computer. The invention particularly concerns the application of a potential across two electrodes on the surface of the substrate to create a field to separate and sweep out electron-hole pairs formed within the substrate. A detector is then used to detecting transient current in the electrodes, and so determine the arrival of a single ion in the substrate.