The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2006

Filed:

May. 28, 2004
Applicants:

Hideki Sasaki, Tokyo, JP;

Shigeo Kurose, Tokyo, JP;

Hiroyuki Tanaka, Tokyo, JP;

Inventors:

Hideki Sasaki, Tokyo, JP;

Shigeo Kurose, Tokyo, JP;

Hiroyuki Tanaka, Tokyo, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 8/30 (2006.01); C08F 259/04 (2006.01); C08G 18/81 (2006.01); C08G 18/82 (2006.01); C08L 75/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron beam curing resin for a magnetic recording medium is provided, wherein a known thermosetting vinyl chloride resin or polyurethane resin is modified to become sensitive to an electron beam, and the resulting resin has a high cross-linking property. A method for readily manufacturing the above-described electron beam curing resin from a known thermosetting resin is provided. Furthermore, a high-performance magnetic recording medium including the above-described electron beam curing resin is provided. The electron beam curing resin is produced through a reaction between active hydrogen groups of a vinyl chloride resin or polyurethane resin having the active hydrogen groups in a molecule and a compound having an isocyanate group and a radical-polymerizing unsaturated double bond in a molecule, wherein the amount of water in the reaction system is controlled at 0.05 to 0.5 percent by mass relative to the resin when the reaction is effected.


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