The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Jun. 18, 2004
Yoshiyuki Tanaka, Kanagawa, JP;
Hironobu Narui, Kanagawa, JP;
Yoshinori Yamauchi, Kanagawa, JP;
Yuichi Kuromizu, Kanagawa, JP;
Yoshiaki Watanabe, Kanagawa, JP;
Yoshiyuki Tanaka, Kanagawa, JP;
Hironobu Narui, Kanagawa, JP;
Yoshinori Yamauchi, Kanagawa, JP;
Yuichi Kuromizu, Kanagawa, JP;
Yoshiaki Watanabe, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
This invention provides a steam oxidation method of a matter to be oxidized with proper controllability and reproducibility. It is provided a steam oxidation method, where a semiconductor substrate (a matter to be oxidized) is housed in a steam oxidation reactor and is subjected to: a first step of supplying Ngas to the reactor housing the semiconductor substrate and substituting the inside of the reactor with Ngas; a second step of stopping supply of the Ngas and supplying a steam-accompanied Ngas, in which the Ngas is accompanied with steam, to the reactor; a third step of increasing a temperature of the semiconductor substrate to 450° C. (a steam oxidation temperature) while supplying the steam-accompanied Ngas; and a fourth step of holding the semiconductor substrate for a predetermined time at 450° C.