The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Mar. 20, 2003
Osamu Masuda, Hino, JP;
Kazumi Furuta, Akishima, JP;
Osamu Masuda, Hino, JP;
Kazumi Furuta, Akishima, JP;
Konica Corporation, Tokyo, JP;
Abstract
A method of drawing a pattern on a base material by scanning a beam, comprising: drawing a pattern including ring-shaped zones on a first pattern-drawn field on a base material by scanning a beam on a first pattern-drawn field; shifting at least one of the beam source and the base material to scan the beam on a second pattern-drawn field located next to the first pattern-drawn field in such a way that a boundary between the first pattern-drawn field and the second pattern-drawn field is positioned at a joint portion between a slope portion and a side wall portion of the ring-shaped zones; and drawing the pattern on the second pattern-drawn field by scanning a beam so that the joint portion between the slope portion and the side wall portion is drawn at the boundary between the first pattern-drawn field and the second pattern-drawn field.