The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 2006
Filed:
Sep. 05, 2002
Lisa Dhar, New Providence, NJ (US);
Lisa Dhar, New Providence, NJ (US);
InPhase Technologies, Inc., Longmont, CO (US);
Abstract
The present invention provides a solution to the needs described above through a method for forming multiply patterned optical articles. The method comprises providing a micromold having a pre-patterned surface structure, disposing a photorecording medium comprising a matrix precursor and a photoactive monomer on a holder surface, moving the micromold to the photorecording medium on the holder surface such that the pre-patterned surface structure contacts the photorecording medium, wherein the photorecording medium conforms to the pre-patterned surface structure of the micromold, at least partially curing the photorecording medium adherent while the micromold pre-patterned surface structure contacts the photorecording medium, and further patterning the photorecording medium by irradiating the photorecording medium with laser light to polymerize the photoactive monomer.