The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2006

Filed:

Aug. 01, 2003
Applicants:

Alexander T. Schwarm, Austin, TX (US);

Arulkumar P. Shanmugasundram, Sunnyvale, CA (US);

Jacques Seror, Jerusalem, IL;

Yuri Kokotov, Maaleh Adumim, IL;

Efim Entin, Jerusalem, IL;

Inventors:

Alexander T. Schwarm, Austin, TX (US);

Arulkumar P. Shanmugasundram, Sunnyvale, CA (US);

Jacques Seror, Jerusalem, IL;

Yuri Kokotov, Maaleh Adumim, IL;

Efim Entin, Jerusalem, IL;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system, method and medium of controlling a semiconductor manufacturing tool using a feedback control mechanism. The feedback control mechanism includes features for receiving data points relating to an output of the tool. The data points include a current data point and at least one previous data point. The feedback control mechanism also includes features for determining whether the current data point is an erroneous outlier by comparing the current data point to a statistical representation of the at least one previous data point, and based on whether the at least one previous data point is an outlier. The feedback control mechanism further includes features for disregarding the current data point in calculating a feedback value of the feedback control mechanism if the current data point is determined as an erroneous outlier.


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