The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Jun. 14, 2005
Applicant:
Tomoharu Hase, Utsunomiya, JP;
Inventor:
Tomoharu Hase, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G02B 7/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus includes an illumination optical system for illuminating an original with ultraviolet light, a projection optical system for projecting a pattern of the original onto a substrate to be exposed, and a gas purging device for replacing an inside space, where optical components of at least one of the illumination optical system and the projection optical system are placed, with a gas containing substantially no water content or an inert gas.
Quick Actions:
Hase, Tomoharu. (2006). Exposure apparatus and device manufacturing method including gas purging of a space containing optical components (U.S. Patent No. 6999159). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6999159
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile