The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Nov. 16, 2003
Teng-yen Huang, Taipei, TW;
Teng-Yen Huang, Taipei, TW;
Nanya Technology Corp., Tao-Yuan Hsien, TW;
Abstract
An optical proximity correction (OPC) method for modifying a photomask layout. The photomask layout includes a first photomask pattern including a first straight line and a second straight line arranged in parallel with the first straight line. The first and second straight lines have a first line-end and a second line-end respectively. The second line-end is closer to a second photomask pattern than the first line-end. The method includes performing a rule-based OPC to generate a corrected photomask layout, and adding an enhancing feature in the first line-end. The width of the enhancing feature is smaller than that of the first line. The second line-end is still closer to the second photomask pattern than the first line-end with the enhancing feature.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile