The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2006
Filed:
Nov. 22, 2002
Bradley F. Bowden, Edison, NJ (US);
Seann Bishop, Raleigh, NC (US);
Kenneth E. Hrdina, Horseheads, NY (US);
John F. Wight, Jr., Corning, NY (US);
Bradley F. Bowden, Edison, NJ (US);
Seann Bishop, Raleigh, NC (US);
Kenneth E. Hrdina, Horseheads, NY (US);
John F. Wight, Jr., Corning, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
The invention discloses a method for forming substantially striae-free glass substrates that are suitable for optical applications, including use in forming optical elements or structures such as mirrors and platen stage structures that can be used, for example, in EUV lithography. The method includes forming a mixture of silica soot, binder, lubricant and solvent. The homogenized mixture is then extruded through a slit die or mask into a flat planar pre-form, and the extruded pre-form is then consolidated by heating into a substantially full density, substantially striae-free lithography glass substrate structure. The consolidated perform has a substantially uniform coefficient of thermal expansion and is also substantially void free.