The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 2006

Filed:

Mar. 22, 2004
Applicants:

Jeffrey L. Duerk, Avon Lake, OH (US);

Jonathan S. Lewin, Baltimore, MD (US);

Hisamoto Moriguchi, Cleveland, OH (US);

Inventors:

Jeffrey L. Duerk, Avon Lake, OH (US);

Jonathan S. Lewin, Baltimore, MD (US);

Hisamoto Moriguchi, Cleveland, OH (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of chemical species suppression for MRI imaging of a scanned object region including acquiring K space data at a first TE, acquiring K space data at a second TE, reconstructing images having off resonance effects, estimating off resonance effects at locations throughout the reconstructed image, and determining the first and second chemical species signals at image locations of the scanned object from the acquired signals and correcting for blurring resulting from off resonance effects due to Binhomogeneity.


Find Patent Forward Citations

Duerk, Jeffrey. (2006). Chemical species suppression for mri imaging using spiral trajectories with off-resonance correction (U.S. Patent No. 6995560). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6995560

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…