The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Jun. 30, 2003
Hiroshi Tokailin, Sodegaura, JP;
Yoshikazu Nagasaki, Sodegaura, JP;
Hiroshi Tokailin, Sodegaura, JP;
Yoshikazu Nagasaki, Sodegaura, JP;
Idemitsu Kosan Co., Ltd., Tokyo, JP;
Abstract
The present invention concerns a method of forming one or more thin films on a substrate by depositing two or more materials by vacuum evaporation, comprising, depositing each material under such control that ni value of the each material is k±0.5 wherein k is a constant from 2 to 5, when relationship between a deposition position and a film thickness of a material i on the substrate is approximated by the following equation (1):D/D(L/L)cosθ  (1)wherein Lis a distance from an evaporation source to a plane of the substrate in a perpendicular direction, Dis a film thickness of the material i at an intersection point of a perpendicular line from the evaporation source to the plane of the substrate, and Dis a film thickness of the material i at a position on the substrate which is apart from the evaporation source by a distance Lin a direction of an angle θagainst the perpendicular line. By the method, a homogenous thin film layer for an element can be formed even on a substrate having large screen.