The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Aug. 10, 2001
Shin-ichiro Hatta, Nara, JP;
Ryuichi Murai, Toyonaka, JP;
Hiroshi Iwamoto, Toyonaka, JP;
Shigeo Nakatera, Hirakata, JP;
Tetsuro Ozawa, Ibaraki, JP;
Shin-ichiro Hatta, Nara, JP;
Ryuichi Murai, Toyonaka, JP;
Hiroshi Iwamoto, Toyonaka, JP;
Shigeo Nakatera, Hirakata, JP;
Tetsuro Ozawa, Ibaraki, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A cathode ray tube is provided, in which the flatness of a tension mask constituting a color-selection mechanism is maintained by a suitable stretching force, while with the tension mask, the influence of external magnetic fields, such as the terrestrial magnetism is suppressed, and the shifting of the electron beam is reduced. A tension mask made of a magnetostrictive material is used, the tension mask is stretched by a stretching force in a range maintaining the flatness of the tension mask, and the direction and strength of the stretching force are set such that vertical magnetic permeability of the tension mask increases, due to a magnetoelastic effect caused by the stretching force in the magnetostrictive material of the tension mask.