The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Jun. 10, 2004
Valery Garber, Yokneam Elite, IL;
Emanuel Baskin, Haifa, IL;
Alexander Epstein, Haifa, IL;
Alexander Fayer, Herzlia, IL;
Boris Spektor, Haifa, IL;
Valery Garber, Yokneam Elite, IL;
Emanuel Baskin, Haifa, IL;
Alexander Epstein, Haifa, IL;
Alexander Fayer, Herzlia, IL;
Boris Spektor, Haifa, IL;
Sirica Corporation, Dallas, TX (US);
Abstract
Methods and specialized media adapted to the formation of a steady-state, non-equilibrium distribution of free carriers using mesoscopic classical confinement. Specialized media is silicon-based (e.g., crystalline silicon, amorphous silicon, silicon dioxide) and formed from mesoscopic sized particles embedded with a matrix of wide-bandgap material, such as silicon dioxide. An IR to visible light imaging system is implemented around the foregoing.