The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Sep. 29, 2003
Mark B. Miller, Houston, TX (US);
Scott Cooper, Humble, TX (US);
Juan Jose Aguirre, League City, TX (US);
Mark Leland, Houston, TX (US);
Mark B. Miller, Houston, TX (US);
Scott Cooper, Humble, TX (US);
Juan Jose Aguirre, League City, TX (US);
Mark Leland, Houston, TX (US);
Fina Technology, Inc., Houston, TX (US);
Abstract
Disclosed is a method of producing a novel biaxially oriented film having a high diffraction of light, and flexibility. In particular, the invention disclosed provides a method for making an opaque impact copolymer film by stretching in two dimensions an impact polypropylene copolymer. The invention is disclosed to be useful for making a material particularly suitable for a variety of applications including labeling media, food packaging and laminates. Also disclosed is a multilayer film having a first impact polypropylene copolymer layer and a second layer of another polymer wherein the multilayer film has significantly reduced haze. Also disclosed is film produced with a filler that has increased porosity and flexibility.