The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Sep. 05, 2001
Applicants:
Kang L. Wang, Santa Monica, CA (US);
Jianlin Liu, Los Angeles, CA (US);
Inventors:
Kang L. Wang, Santa Monica, CA (US);
Jianlin Liu, Los Angeles, CA (US);
Assignee:
The Regents of the University of California, Oakland, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/205 (2006.01);
U.S. Cl.
CPC ...
Abstract
A metallic surfactant, e.g., Sb, Bi, As, or atomic hydrogen is used to grow a high quality, relaxed, relatively thin SiGe buffer having a very smooth surface and a very low threading dislocation density, on which high-quality films are epitaxially grown for various applications.