The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Oct. 04, 2004
Irene Chen, Tao-Yuan Hsien, TW;
Tien-yu Chou, Tao-Yuan Hsien, TW;
Jyh-huei Lay, Tao-Yuan Hsien, TW;
Yuan-hung Wang, Tao-Yuan Hsien, TW;
Jo-wen Wu, Tao-Yuan Hsien, TW;
Chin-chen Yang, Tao-Yuan Hsien, TW;
Chuan-lun Hsu, Tao-Yuan Hsien, TW;
Irene Chen, Tao-Yuan Hsien, TW;
Tien-Yu Chou, Tao-Yuan Hsien, TW;
Jyh-Huei Lay, Tao-Yuan Hsien, TW;
Yuan-Hung Wang, Tao-Yuan Hsien, TW;
Jo-Wen Wu, Tao-Yuan Hsien, TW;
Chin-Chen Yang, Tao-Yuan Hsien, TW;
Chuan-Lun Hsu, Tao-Yuan Hsien, TW;
U-Tech Media Corp., Tao-Yuan Hsien, TW;
Abstract
First, a substrate is provided, and a half-tone mask is employed to perform an exposing and developing process for forming a plurality of photoresist patterns having different thickness. Then, a flow process is performed to heat the photoresist patterns so that each photoresist pattern has a microlens surface. Following that, a metal plate is formed on the substrate for obtaining a plurality of patterns, which are opposite to the plurality of photoresist patterns, on the bottom surface. Finally, the metal plate is removed from the substrate, and combined with an insert mold.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile