The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Sep. 17, 2003
Yong-chen Chung, Hsinchu, TW;
Chia-hung Lin, Hsinchu, TW;
Chia-chun Hsu, Hsinchu, TW;
Chuan-feng Chen, Hsinchu, TW;
Wen-hung Feng, Hsinchu, TW;
Ming-chi Chen, Hsinchu, TW;
Yong-Chen Chung, Hsinchu, TW;
Chia-Hung Lin, Hsinchu, TW;
Chia-Chun Hsu, Hsinchu, TW;
Chuan-Feng Chen, Hsinchu, TW;
Wen-Hung Feng, Hsinchu, TW;
Ming-Chi Chen, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A uniform pressing apparatus used in nanoimprint lithographic process is proposed, including a housing having a first flange; a first carrier unit for carrying an imprint mold and having at least one second flange freely attaches to the first flange; a second carrier unit for carrying a substrate; at least one uniform pressing unit mounted on a imprint force transmission path; and a power source driving at least one of the housing and the second carrier unit to allow a contact to be formed between the mold and the moldable layer. Therefore, the nanoimprint lithographic process is achieved with good parallelism between the substrate and the mold and with uniform pressure distribution.