The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2006
Filed:
Jul. 15, 2003
Deepak Saha, Worcester, MA (US);
Diran Apelian, West Boylston, MA (US);
Mark A. Musser, Osceola, IN (US);
Dayne Killingsworth, South Bend, IN (US);
Zach Brown, Kalamazoo, MI (US);
Deepak Saha, Worcester, MA (US);
Diran Apelian, West Boylston, MA (US);
Mark A. Musser, Osceola, IN (US);
Dayne Killingsworth, South Bend, IN (US);
Zach Brown, Kalamazoo, MI (US);
SPX Corporation, Charlotte, NC (US);
Abstract
A method for the refining of primary silicon in hypereutectic alloys by mixing at least two hypereutectic alloys into a solid/semi-solid hypereutectic slurry is described. The method provides control of the morphology, size, and distribution of primary Si in a hypereutectic Al—Si casting by mixing a hypereutectic Al—Si liquid with solid hypereutectic Al—Si particles. The invention enables SSM processing of hypereutectic Al—Si alloys.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile