The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Aug. 13, 2003
Stephen J. Mihailov, Kanata, CA;
Christopher W. Smelser, Ottawa, CA;
Ping LU, Ottawa, CA;
Robert B. Walker, Spencerville, CA;
Dan Grobnic, Ottawa, CA;
Huimin Ding, Nepean, CA;
George Henderson, Ottawa, CA;
Xiaoli Dai, Ottawa, CA;
Stephen J. Mihailov, Kanata, CA;
Christopher W. Smelser, Ottawa, CA;
Ping Lu, Ottawa, CA;
Robert B. Walker, Spencerville, CA;
Dan Grobnic, Ottawa, CA;
Huimin Ding, Nepean, CA;
George Henderson, Ottawa, CA;
Xiaoli Dai, Ottawa, CA;
Abstract
A novel method and apparatus for varying the index of refraction of a material using an interference pattern is disclosed. The method and apparatus incorporate an ultra short duration pulse laser source. Electromagnetic radiation provided from the laser propagates to a diffractive element positioned in close proximity to the target material. The diffracted electromagnetic radiation forms an interference pattern, the peaks of which are sufficiently intense to cause a change in index of refraction.