The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Feb. 06, 2001
Toshihisa Suzuki, Hamamatsu, JP;
Naoshi Horiai, Hamamatsu, JP;
Toshihisa Suzuki, Hamamatsu, JP;
Naoshi Horiai, Hamamatsu, JP;
Yamaha Corporation, Shizuoka-Ken, JP;
Abstract
In order to realize a magnetic resistance device having a high magnetic resistance change rate, satisfactory production yield and a low level of variation in production, a pair of magnetic tunnel resistance devicesemploying a laminated structure comprised of antiferromagnetic film, lower magnetic layer, barrier filmand upper magnetic layerare independently and separately formed by ion beam etching on a lower electrodeand in common with said lower electrodeprovided on a substrate. A pair of independent upper electrodesare formed on upper magnetic layer. As a result, a pair of magnetic tunnel resistance devicesare formed connected in series on substrate