The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Dec. 29, 2003
Nobuaki Ueki, Saitama, JP;
Nobuaki Ueki, Saitama, JP;
Fujinon Corporation, Saitama, JP;
Abstract
A Fizeau interferometer apparatus is used for both low and high interference measurement. When irradiating a reference surface and a sample with a low coherent luminous flux, a path-matching passage divides the low coherent luminous flux into first and second paths, while the optical path length difference between the respective luminous fluxes passed through the two paths equals twice the optical distance between the reference surface and the sample. When irradiating the reference surface and the sample with a high coherent luminous flux, the luminous flux is made incident on the sample side of the path-matching passage at a position coaxial with the low coherent luminous flux.