The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Nov. 12, 2003
Pietro Erratico, Milan, IT;
Enrico Sacchi, Pavia, IT;
Flavio Villa, Milan, IT;
Gabriele Barlocchi, Cornaredo, IT;
Pietro Corona, Rome, IT;
Pietro Erratico, Milan, IT;
Enrico Sacchi, Pavia, IT;
Flavio Villa, Milan, IT;
Gabriele Barlocchi, Cornaredo, IT;
Pietro Corona, Rome, IT;
STMicroelectronics, S.r.l., Agrate Brianza, IT;
Abstract
The process comprises the steps of forming, on top of a semiconductor material wafer, a holed mask having a lattice structure and comprising a plurality of openings each having a substantially square shape and a side with an inclination of 45° with respect to the flat of the wafer; carrying out an anisotropic etch in TMAH of the wafer, using said holed mask, thus forming a cavity, the cross section of which has the shape of an upside-down isosceles trapezium; and carrying out a chemical vapor deposition using TEOS, thus forming a TEOS layer which completely closes the openings of the holed mask and defines a diaphragm overlying the cavity and on which a suspended integrated structure can subsequently be manufactured.