The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
May. 26, 2004
Rieko Nishio, Kyoto, JP;
Toshihiro Kuriyama, Otsu, JP;
Rieko Nishio, Kyoto, JP;
Toshihiro Kuriyama, Otsu, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A solid-state imaging device production method is provided. A light-receiving sectionis formed on a semiconductor substrate. A first insulating filmis formed on a light-receiving sectionand the semiconductor substrate. A metal film for wiring is formed on the first insulating film. A protection filmis formed on the metal film. A resist film is formed on a predetermined region of the protection film. A portion of the protection filmand a portion of the metal film is removed by using the resist film to form a wirewhose upper face is covered by the protection film. A hydrogen-containing second insulating filmis formed on the wireand the first insulating film. A heating process is performed for the second insulating film. An anisotropic etching process is performed for the entire surface of the second insulating filmto remove the second insulating film