The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Apr. 04, 2001
Applicants:
Michael Raymond Connelly, Crown Point, IN (US);
Dennis Patrick Stack, Warrington, PA (US);
Richard Shu-hua Wu, Fort Washington, PA (US);
Ronald Ray Zimmer, Nescopeck, PA (US);
Inventors:
Michael Raymond Connelly, Crown Point, IN (US);
Dennis Patrick Stack, Warrington, PA (US);
Richard Shu-Hua Wu, Fort Washington, PA (US);
Ronald Ray Zimmer, Nescopeck, PA (US);
Assignee:
Rohm and Haas Company, Philadelphia, PA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G05D 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a process for controlling the level of in-process monomer in an emulsion polymerization reaction. Also disclosed is a method of controlling particle size by controlling the level of in-process monomer.