The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Oct. 22, 2003
Muniswamappa Anjanappa, Ellicott City, MD (US);
David T. Bach, Ellicott City, MD (US);
Muniswamappa Anjanappa, Ellicott City, MD (US);
David T. Bach, Ellicott City, MD (US);
Scientific Products & Systems, Baltimore, MD (US);
University of Maryland UMBC, Baltimore, MD (US);
Abstract
A method of making beams, clamps and other structures by curing a polymer containing a magnetostrictive material. A magnetostrictive material like TERFENOL-D™ is placed in a polymer. This mixture is put onto a slide in a film. The mixture is cured by UV light (or other means) so that it cross-links. A second layer of polymer with no magnetostrictive material can be cured on top of the first layer. This leads to a beam structure which exhibits a bending moment in an applied magnetic field. By aligning the magnetostrictive particles before curing with a magnetic field, a beam or other structure can be produced with aligned particles. A mask can be used to selectively cure regions where the magnetostrictive particles have different alignments on the same layer. It is possible to build up multiple layer structures with layers of magnetostrictive particles aligned in different directions.