The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2006

Filed:

Sep. 20, 2004
Applicant:

Donald G. Bruns, San Diego, CA (US);

Inventor:

Donald G. Bruns, San Diego, CA (US);

Assignee:

Ophthonix, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 21/02 (2006.01); B23K 26/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The wavefront aberrator of the present invention includes a pair of transparent windows, or plates, separated by a layer of monomers and polymerization initiator, including a broad class of epoxies. This monomer exhibits a variable index of refraction across the layer, resulting from controlling the extent of its curing. Curing of the epoxy may be made by exposure to light, such as ultraviolet light. The exposure to light may be varied across the surface of the epoxy to create a particular and unique refractive index profile.


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