The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Dec. 04, 2003
Yuichi Osakabe, Tochigi, JP;
Yoshinori Ohsaki, Tochigi, JP;
Yuichi Osakabe, Tochigi, JP;
Yoshinori Ohsaki, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A scanning exposure apparatus for exposing a substrate () to a pattern with an original () through a projection optical system (), while scanning the original and the substrate, includes a first detection system () which detects a first substrate reference mark () corresponding to the substrate through the projection optical system on/at at least one of an optical axis of the projection optical and an off-axis position shifted from the optical axis in a scanning direction, and an alignment system () which aligns the original and the substrate on the basis of a detection result of the first detection system.