The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2006

Filed:

Jan. 07, 2003
Applicants:

Gérard Bellec, Versailles, FR;

Pierre Boissel, Fontenay les Briis, FR;

Michel Heninger, Etiolles, FR;

Joël Lemaire, Antony, FR;

Gérard Mauclaire, Limours, FR;

Inventors:

Gérard Bellec, Versailles, FR;

Pierre Boissel, Fontenay les Briis, FR;

Michel Heninger, Etiolles, FR;

Joël Lemaire, Antony, FR;

Gérard Mauclaire, Limours, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

A vacuum ion trap includes a gastight processing enclosure and a permanent magnet defining a cavity and creating a directed magnetic field in the cavity, the enclosure being disposed inside the cavity and containing a confinement cell having at least two mutually parallel trapping electrodes perpendicular to the directed magnetic field, the trapping electrodes being connectable to a voltage generator. The trap includes at least one permanent magnet in the form of a hollow cylinder and structured with a Halbach cylinder type structure so as to generate the permanent magnetic field directed perpendicularly to the longitudinal axis of the cavity of the magnet. The trap is applicable in particular to Fourier transform mass spectrometry (FTICR).


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