The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2006

Filed:

Jan. 16, 2003
Applicants:

Smuruthi Kamepalli, Rochester, MI (US);

Thomas H. Baum, New Fairfield, CT (US);

Inventors:

Smuruthi Kamepalli, Rochester, MI (US);

Thomas H. Baum, New Fairfield, CT (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F 9/00 (2006.01); H01L 21/44 (2006.01); B05D 1/02 (2006.01); C23C 14/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Tantalum precursors suitable for chemical vapor deposition of tantalum-containing material, e.g., tantalum, TaN, TaSiN, etc., on substrates. The tantalum precursors are substituted cyclopentadienyl tantalum compounds. In one aspect of the invention, such compounds are silylated to constitute tantalum/silicon source reagents. The precursors of the invention are advantageously employed in semiconductor manufacturing applications to form diffusion barriers in connection with copper metallization of the semiconductor device structure.


Find Patent Forward Citations

Kamepalli, Smuruthi. (2006). Chemical vapor deposition precursors for deposition of tantalum-based materials (U.S. Patent No. 6989457). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6989457

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…