The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Jan. 15, 2004
Seung-heon Lee, Daejeon, KR;
Frédéric S. Diana, Santa Clara, CA (US);
Antonio Badolato, Santa Barbara, CA (US);
Pierre M. Petroff, Santa Barbara, CA (US);
Edward J. Kramer, Santa Barbara, CA (US);
Seung-Heon Lee, Daejeon, KR;
Frédéric S. Diana, Santa Clara, CA (US);
Antonio Badolato, Santa Barbara, CA (US);
Pierre M. Petroff, Santa Barbara, CA (US);
Edward J. Kramer, Santa Barbara, CA (US);
The Regents of the University of California, Oakland, CA (US);
Abstract
A method and resultant device, in which metal nanoparticles are self-assembled into two-dimensional lattices. A periodic hole pattern (wells) is fabricated on a photoresist substrate, the wells having an aspect ratio of less than 0.37. The nanoparticles are synthesized within inverse micelles of a polymer, preferably a block copolymer, and are self-assembled onto the photoresist nanopatterns. The nanoparticles are selectively positioned in the holes due to the capillary forces related to the pattern geometry, with a controllable number of particles per lattice point.