The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Jan. 23, 2002
Craig James Hamilton, Ralston, GB;
Olek Peter Kowalski, Paisley, GB;
John Haig Marsh, Glasgow, GB;
Stewart Duncan Mcdougall, Lanark, GB;
Craig James Hamilton, Ralston, GB;
Olek Peter Kowalski, Paisley, GB;
John Haig Marsh, Glasgow, GB;
Stewart Duncan McDougall, Lanark, GB;
The University Court of the University of Glasgow, Glasgow, GB;
Abstract
There is disclosed a method of manufacturing of optical devices, for example, semiconductor optoelectronic devices such as laser diodes, optical modulators, optical amplifiers, optical switches, and the like. There is further disclosed Optoelectronic Integrated Circuits (OEICs) and Photonic Integrated Circuits (PICs) including such devices. According to the present invention there is provided a method of manufacturing an optical device (), a device body portion () from which the device () is to be made including a Quantum Well Intermixing (QWI) structure (), the method including the step of plasma etching at least part of a surface of the device body portion () prior to depositing a dielectric layer () thereon so as to introduce structural defects at least into a portion () of the device body portion () adjacent the dielectric layer (). The structural defects substanially comprise 'point' defects.