The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Oct. 09, 2002
Applicants:
Timothy G. Adams, Sudbury, MA (US);
Matthew A. King, Boston, MA (US);
Inventors:
Timothy G. Adams, Sudbury, MA (US);
Matthew A. King, Boston, MA (US);
Assignee:
Shipley Company, L.L.C., Marlborough, MA (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/30 (2006.01); C08F 220/12 (2006.01); C08F 220/18 (2006.01); C08F 116/12 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.