The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2006
Filed:
Nov. 30, 2004
Leslie Bruce Wilner, Palo Alto, CA (US);
Leslie Bruce Wilner, Palo Alto, CA (US);
Endevco Corporation, San Juan Capistrano, CA (US);
Abstract
A piezoresistive strain concentrator that converts mechanical movement into electrical output and a process for fabricating the concentrator are provided. The device includes a strain sensing structure composed of a piezoresistive strain sensitive element that spans a gap in a substrate. The strain sensing structure is supported on a strain concentrating structure also spanning the gap that has vertical walls extending to a cross-section at the base of the gap, both structures being etched from the substrate. The structure of the strain-concentrating support for the strain sensitive element is fabricated by deep reactive ion etch (DRIE). The strain sensing structure has an increased sensitivity, a low gage factor and an increased resistance to buckling and fracture compared to previous strain gage structures. Several of the strain sensing structures can be connected in a sequence in a bridge circuit.