The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2006

Filed:

Sep. 04, 2003
Applicants:

Ernest F. Hasselbrink, Jr., Saline, MI (US);

Jason E. Rehm, Alameda, CA (US);

Timothy J. Shepodd, Livermore, CA (US);

Brian J. Kirby, San Francisco, CA (US);

Inventors:

Ernest F. Hasselbrink, Jr., Saline, MI (US);

Jason E. Rehm, Alameda, CA (US);

Timothy J. Shepodd, Livermore, CA (US);

Brian J. Kirby, San Francisco, CA (US);

Assignee:

Sandia National Laboratories, Livermore, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cast-in-place and lithographically shaped mobile, monolithic polymer element for fluid flow control in microfluidic devices and method of manufacture. Microfluid flow control devices, or microvalves that provide for control of fluid or ionic current flow can be made incorporating a cast-in-place, mobile monolithic polymer element, disposed within a microchannel, and driven by fluid pressure (either liquid or gas) against a retaining or sealing surface. The polymer elements are made by the application of lithographic methods to monomer mixtures formulated in such a way that the polymer will not bond to microchannel walls. The polymer elements can seal against pressures greater than 5000 psi, and have a response time on the order of milliseconds. By the use of energetic radiation it is possible to depolymerize selected regions of the polymer element to form shapes that cannot be produced by conventional lithographic patterning and would be impossible to machine.


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