The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2006
Filed:
Feb. 09, 2005
Clyde N. Richards, San Diego, CA (US);
Clyde N. Richards, San Diego, CA (US);
Other;
Abstract
Process and apparatus for gas cleaning, as in HVAC systems or semiconductor manufacturing clean rooms, for removing 99.999% of particulate and gaseous contaminants, which may be effectively used to remove and neutralize Bio-chem agents introduced by terrorists, having a first stage in which large quantities of positively charged liquid droplets are introduced into the gas to be cleaned so as to remove virtually all negatively charged particulates and at least 90% of neutral particulates and soluble gases; a second stage in which most positively charged droplets from the first stage are removed and remaining particulates are given a positive charge; a third stage in which large quantities of negatively charged liquid droplets are introduced to remove positively charged particulates and more soluble gas contaminants; and a fourth stage in which the negatively charged droplets are removed from the cleaned gas stream.