The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
May. 09, 2003
Li-ping Wang, Fremont, CA (US);
Li-Ping Wang, Fremont, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A method of forming a magnetic transition pattern in a magnetic material by contact printing comprises steps of providing a stacked assembly including a workpiece including a surface comprised of the magnetic material including a plurality of initialized, unidirectionally aligned magnetic domains, and a high saturation magnetization stamper having an imprinting surface in intimate contact with the workpiece surface, the imprinting surface comprising a plurality of projections and depressions arranged in a pattern corresponding to the magnetic transition pattern to be formed in the magnetic material, and selectively magnetically re-aligning the initialized, unidirectionally aligned magnetic domains by placing the assembly in a fixed gap contact printing apparatus including a magnet means having a pair of spaced-apart, stationary magnetic poles providing an oppositely directed, uniform intensity, unidirectional re-alignment magnetic field.