The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2006
Filed:
May. 06, 2003
Dequan Yu, Ann Arbor, MI (US);
Norman Nelson Krieger, Milford, MI (US);
Stephen Thomas Kempfer, Canton, MI (US);
Joseph Grabowski, Grosse lle, MI (US);
DeQuan Yu, Ann Arbor, MI (US);
Norman Nelson Krieger, Milford, MI (US);
Stephen Thomas Kempfer, Canton, MI (US);
Joseph Grabowski, Grosse lle, MI (US);
Visteon Global Technologies, Inc., Van Buren Township, MI (US);
Abstract
A ring impeller includes a central hub with a first row of vanes extending from the hub and a second row of vanes extending from the hub adjacent to and staggered from the first row of vanes. The vanes in each row are grouped to form adjacent vane pairs and a partition wall is positioned between each of the vanes within the vane pairs. A rib extends radially from the hub in alignment with the partition wall and is positioned between each vane pair. The bottom thickness of the partition wall is the same thickness as the rib. The partition wall includes a reduced material area at its forward and rear edges. The vanes in the first row are unevenly spaced and the vanes in the second row are spaced equidistantly between the vanes in the first row. The spacing of the vanes in the first row may be about 70% to about 140% of a spacing equal to an equal spacing. Some of the vanes may have a height that is less than the height of other vanes.