The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2006
Filed:
May. 01, 2002
Hugues Herve Hoppe, Redmond, WA (US);
John Michael Snyder, Redmond, WA (US);
Pedro Vieira Sander, Cambridge, MA (US);
Steven Jacob Gortler, Cambridge, MA (US);
Hugues Herve Hoppe, Redmond, WA (US);
John Michael Snyder, Redmond, WA (US);
Pedro Vieira Sander, Cambridge, MA (US);
Steven Jacob Gortler, Cambridge, MA (US);
Microsoft Corporation, Redmond, WA (US);
Abstract
Systems and methods are provided for providing a fine-to-coarse look ahead in connection with parametrization in a graphics system. The use of a variety of parametrization metrics may be supplemented and improved by the fine-to-coarse look ahead techniques of the invention. First, the metric of a parametrization is minimized using a coarse-to-fine hierarchical solver, and then accelerated with a fine-to-coarse propagation. The resulting parametrizations have increased texture resolution in surface regions with greater signal detail at all levels of detail in the progressive mesh sequence.