The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 03, 2006
Filed:
May. 11, 2004
Nicholas F. Borrelli, Elmira, NY (US);
Charlene M. Smith, Corning, NY (US);
Johannes Moll, Painted Post, NY (US);
Nicholas F. Borrelli, Elmira, NY (US);
Charlene M. Smith, Corning, NY (US);
Johannes Moll, Painted Post, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×10molecules/cmand about 0.18×10molecules/cmare provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.