The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 03, 2006

Filed:

Dec. 15, 2003
Applicants:

Dezheng Wang, Beijing, CN;

Fei Wei, Beijing, CN;

Jinfu Wang, Beijing, CN;

Inventors:

Dezheng Wang, Beijing, CN;

Fei Wei, Beijing, CN;

Jinfu Wang, Beijing, CN;

Assignee:

Tsinghua University, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 15/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for measuring the gas amounts adsorbed on a powder which directly measures pressure changes in a gas supply chamber with the use of differential pressure sensors between the gas supply chamber and a reference chamber which gas amount is maintained constant. Calculations of the gas amounts adsorbed are based on the pressure changes in a sample cell and the pressure changes in the gas supply chamber or a gas reference chamber. The method and apparatus of this invention measures the adsorption or desorption isotherm or gas uptake at constant pressure curve of a powder with, as compared with presently available measurement techniques, increased accuracy and resolution. The experimental data can be analyzed to obtain information on the surface area, pore size distribution, pore volume, pore structure and diffusion coefficient of the powder.


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