The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2005

Filed:

Nov. 26, 2003
Applicants:

Baojun LI, Waukesha, WI (US);

Bernhard Erich Hermann Claus, Niskayuna, NY (US);

Gopal B. Avinash, New Berlin, WI (US);

Stephen W. Metz, Greenfield, WI (US);

Jiang Hsieh, Brookfield, WI (US);

Inventors:

Baojun Li, Waukesha, WI (US);

Bernhard Erich Hermann Claus, Niskayuna, NY (US);

Gopal B. Avinash, New Berlin, WI (US);

Stephen W. Metz, Greenfield, WI (US);

Jiang Hsieh, Brookfield, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B006/03 ;
U.S. Cl.
CPC ...
Abstract

A technique is provided for non-uniform weighting in back-projection calculations in tomosythesis. The non-uniform weighting may include weighting based on a count map of the number of times pixels of individual slices are traversed by radiation in different projections. Weighting may also include non-uniform functions for contributions of features at different slice level to the sensed X-ray attenuation system response inconsistencies are accounted for by further weighting based upon projection maps which may be created in separate system calibration or configuration routines.


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