The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Apr. 02, 2004
Applicant:
Masatake Nukui, Tokyo, JP;
Inventor:
Masatake Nukui, Tokyo, JP;
Assignee:
GE Global Systems Global Technology Company, LLC, Waukesha, WI (US);
Primary Examiner:
Int. Cl.
CPC ...
A61B006/03 ;
U.S. Cl.
CPC ...
Abstract
A method for decreasing the streak artifact in the reconstructed image due to the existence of foreign matter of high X-ray absorption rate such as metals. The method includes separating discrete region containing the data having abrupt change of value the projection data in the sequential order of radiographic detector elements, transforming the data to continuous data such that the value gradually smoothly changes, filtering the continuous data, composing the filtered data with the data of the discrete regions to form the projection data used for the image reconstruction.