The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Feb. 19, 2004
Sundeep Chauhan, Edina, MN (US);
Lawrence Bryant, Palo Alto, CA (US);
Neil Deeman, Alamo, CA (US);
Christopher Formato, Brentwood, CA (US);
David Kuo, Palo Alto, CA (US);
Sundeep Chauhan, Edina, MN (US);
Lawrence Bryant, Palo Alto, CA (US);
Neil Deeman, Alamo, CA (US);
Christopher Formato, Brentwood, CA (US);
David Kuo, Palo Alto, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes at least one optical encoder wheel assembly. The optical encoder wheel assembly is configured to provide rotational speed data signal to a rotational speed control system and a pattern generation clock circuit configured to a provide a corrected pattern generator clock signal to a pattern generator circuit. The pattern generation circuit is used to control modulation of an electron beam used for substrate processing. In one aspect of the present invention, repeatable deviations of the rotational speed are measured and processed during substrate processing to correct for such repeatable deviations to increase substrate pattern writing accuracy.