The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6979639 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 27, 2005

Filed:

Mar. 16, 2004
Applicants:

James R. Heath, Los Angeles, CA (US);

Charles P. Collier, Los Angeles, CA (US);

Yi Luo, Los Angeles, CA (US);

Erica Deionno, Los Angeles, CA (US);

Patricia A. Beck, Palo Alto, CA (US);

Inventors:

James R. Heath, Los Angeles, CA (US);

Charles P. Collier, Los Angeles, CA (US);

Yi Luo, Los Angeles, CA (US);

Erica DeIonno, Los Angeles, CA (US);

Patricia A. Beck, Palo Alto, CA (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/4763 ;
U.S. Cl.
CPC ...
Abstract

Methods for making electronic devices where a molecular monolayer or multilayer is sandwiched between top and bottom electrodes at electrode intersections. The molecular layer has an electrical characteristic such as bistable switching. A layer of electrically conductive material is used to protect the molecular layer during formation of the top electrode pattern. The electrically conductive material remains sandwiched between the top and bottom electrodes at the electrode intersections in the final electronic device.


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Heath, James. (2005). Method for lithographic processing on molecular monolayer and multilayer thin films (U.S. Patent No. 6979639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6979639

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