The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Jan. 06, 2005
Junaid Ahmed Siddiqui, Richmond, VA (US);
Daniel Hernandez Castillo, Ii, Laveen, AZ (US);
Rajat Kapoor, Morrisville, NC (US);
Tara Ranae Keefover, Irvine, CA (US);
Robin Edward Richards, Phoenix, AZ (US);
Junaid Ahmed Siddiqui, Richmond, VA (US);
Daniel Hernandez Castillo, II, Laveen, AZ (US);
Rajat Kapoor, Morrisville, NC (US);
Tara Ranae Keefover, Irvine, CA (US);
Robin Edward Richards, Phoenix, AZ (US);
DuPont Air Products Nanomaterials LLC, Tempe, AZ (US);
Abstract
A low defectivity colloidal silica-based product slurry for use in chemical mechanical planarization (CMP) and an associated production method are described. The product slurry is produced using centrifugation of and optionally with addition of a surfactant to a starting colloidal silica (which can be a commercially available colloidal silica). The product slurry has substantially lower levels of soluble polymeric silicates than does the starting colloidal silica and affords lower defectivity levels when used in a slurry for CMP processing than does the starting colloidal silica.