The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6977192 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 20, 2005

Filed:

Sep. 24, 2002
Applicants:

Shunpei Yamazaki, Tokyo, JP;

Toshiji Hamatani, Kanagawa, JP;

Takeshi Fukada, Kanagawa, JP;

Inventors:

Shunpei Yamazaki, Tokyo, JP;

Toshiji Hamatani, Kanagawa, JP;

Takeshi Fukada, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/00 ;
U.S. Cl.
CPC ...
Abstract

In manufacturing a thin film semiconductor device, a gate electrode forming step, a gate insulating film forming step, an amorphous semiconductor film forming step, a crystalline semiconductor film forming step, and an insulating film forming step are performed continuously without breaking vacuum.


Find Patent Forward Citations

Yamazaki, Shunpei. (2005). Method of manufacturing thin film semiconductor device (U.S. Patent No. 6977192). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6977192

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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