The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 20, 2005

Filed:

Apr. 19, 2002
Applicants:

John Bradford Reitz, Clifton Park, NY (US);

Thomas Bert Gorczyca, Schenectady, NY (US);

James Anthony Cella, Clifton Park, NY (US);

Inventors:

John Bradford Reitz, Clifton Park, NY (US);

Thomas Bert Gorczyca, Schenectady, NY (US);

James Anthony Cella, Clifton Park, NY (US);

Assignee:

General Electric, Pittsfield, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C059/02 ;
U.S. Cl.
CPC ...
Abstract

A method for manufacturing an embossed surface including a polymer composition having reactive moieties and a first glass transition temperature of T. The method includes embossing the surface at temperature T; and raising the first glass transition temperature Tof the embossed polymeric surface to a second glass transition temperature Tsuch that T>T. In another embodiment, a method for improving the release of a polymeric surface from an embossing tool includes incorporating of one or more of fluorine atoms, silicon atoms, or siloxane segments into the backbone of the polymer. The methods are particularly suited for direct patterning of photoresists, fabrication of interdigitated electrodes, and fabrication of data storage media.


Find Patent Forward Citations

Loading…